azonenberg changed the topic of #homecmos to: Homebrew CMOS and MEMS foundry design | Wiki: http://homecmos.drawersteak.com/wiki/Main_Page | Repository: http://code.google.com/p/homecmos/ | Logs: http://en.qi-hardware.com/homecmos-logs/
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<chris_99> i thought FIB could only etch stuff, but that's filling something in?
<Sync_> neat
<Sync_> why shouldn't it fill something in
<chris_99> just didn't realise you could do that
<Sync_> we also have a fib at work
<Sync_> but nobody uses it
<Sync_> it is sad
<chris_99> so how do you control it to etch/fill, like what's the difference between those two
<azonenberg> chris_99: When milling, you're sputtering atoms off the surface
<azonenberg> For deposition you're basically doing CVD
<azonenberg> you squirt a precursor gas into the chamber
<azonenberg> it adsorbs onto the sample
<azonenberg> beam ions and secondary electrons cause it to decompose
<Sync_> there are different methods
<chris_99> aha gotcha
<azonenberg> the volatile part dissipates and the metal/whatever sticks
<azonenberg> it's pretty much PECVD with the ions in a beam rather than a plasma filling the whole chamber
<Sync_> we bought the thing to do some fancy selective doping stuff but in the end we did not do that project
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<nmz787> chris_99: you change the gas that's present in the chamber, and it changes the action of the impinging ions
<nmz787> chris_99: that does an OK job for an intro
<chris_99> cheers
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