<nmz787>
if I pattern some photoresist, can I sputter metal/carbon in a room-temp plasma sputterer and hope that if I THEN tried to develop the photoresist that the metal would protect the photoresist from developing (dissolving/falling apart)?
<nmz787>
my idea is pattern resist, coat with metal, add resist and pattern and develop, then etch metal, then develop resist below the metal which was exposed
<nmz787>
if that doesn't sound easy... is there a service I can get planarization done mail-order? (or in-town I guess, in Portland OR)
<nmz787>
It would be suitable to etch pattern resist on silicon, develop and etch the silicon, ash resist, then somehow fill in the etched areas, planarize, then sputter metal and pattern it
<nmz787>
andddd if that isn't easily possible, well I guess I can probably just use a FIB